11B in the form of Boron Trifluoride Gas for Semiconductor Manufacture
Boron trifluoride gas is the ideal silicon wafer dopant for the production of highly integrated, high-density microchips. 11BF3 provides for greater efficiency and increased production throughput, and helps to make chips smaller and better.
|Material||11B – Boron-11 in the form of Boron Trifluoride Electronic Grade|
|Enrichment||11B > 99,9 at%|
|Purity||> 99,99 wt%|
Impurities in vppm
* Our gas is fully compatible with VLIS-requirements.